Chemical vapor deposition : thermal and plasma deposition of electronic materials
| Main Author: | |
|---|---|
| Format: | Book |
| Published: |
New York:
Van Nostrand Reinhold,
1995.
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| Subjects: |
| LEADER | 00539pamaa2200169 4500 | ||
|---|---|---|---|
| 001 | 0000017597 | ||
| 005 | 20060606090000.0 | ||
| 020 | 0 | 0 | |a 0442010796 |
| 082 | |a 621.38152 SIV | ||
| 090 | 0 | 0 | |a TK7836 |b SIV 1995 |
| 100 | 1 | 0 | |a SIVARAM |
| 245 | 1 | 0 | |a Chemical vapor deposition : |b thermal and plasma deposition of electronic materials |c S. Sivaram. |
| 260 | 0 | 0 | |a New York: |b Van Nostrand Reinhold, |c 1995. |
| 300 | |a xi, 292p.: |b 24cm. | ||
| 650 | 0 | 0 | |a Microelectronics industry |
| 650 | 0 | 0 | |a Chemical vapor deposition |
| 650 | 0 | 0 | |a Microelectronics -- |x Materials |